This Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in March 2017; originally published February 2008.

The purpose of this Document is to provide a guide for trimethylsilane (3MS) used in the semiconductor industry.

This Document covers guides for 3MS used in the semiconductor industry for plasma enhanced chemical vapor deposition (PECVD) as low k dielectric and as a SiC etch stop, hard mask and copper diffusion barrier precursor.

None.