NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.
This Standard defines a test method for the determination of particulate contamination from minienvironments used for storage and transport of silicon wafers in semiconductor manufacturing.
The particulate contamination performance of a minienvironment used for storage and transport of silicon wafers is measured in terms of the number of added particles within fixed ranges of size on the surface of silicon wafers exposed to those minienvironments under variable storage, transport, or environmental conditions.
Both user and supplier of the minienvironment shall agree upon all important parameters defined in this Test Method; for example,
• the minienvironment used to store and transport the silicon wafers,
• the silicon wafers exposed to the minienvironment,
• the test equipment used for variable storage, transport, or environmental tests of the minienvironment,
• the analytical equipment used for particulate contamination measurements on the surface of the silicon wafers,
• the environmental conditions around the test equipment and the analytical equipment, and
• the statistical evaluation of the particulate contamination measurement results from the analytical equipment.
These definitions ensure that communication between the user and the supplier of the minienvironment takes place on the same level when specifying these parameters.
Referenced SEMI Standards
SEMI E15 — Specification for Tool Load Port
SEMI E19.4 — 200 mm Standard Mechanical Interface (SMIF)
SEMI E47.1 — Provisional Mechanical Specification for FOUPs Used to Transport and Store 300 mm Wafers
SEMI E87 — Specification for Carrier Management (CMS)
SEMI E91 — Specification for Prober Specific Equipment Model (PSEM)
SEMI E103 — Mechanical Specification for a 300 mm Single-Wafer Box System that Emulates a FOUP
SEMI E108 — Test Method for the Assessment of Outgassing Organic Contamination from Minienvironments Using Gas Chromatography/Mass Spectroscopy
SEMI M1 — Specifications for Polished Monocrystalline Silicon Wafers
SEMI M31 — Provisional Mechanical Specification for Front-Opening Shipping Box Used to Transport and Ship 300 mm Wafers
SEMI M50 — Test Method for Determining Capture Rate and False Count Rate for Surface Scanning Inspection Systems by the Overlay Method
SEMI M52 — Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130-nm Technology Generation
SEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Depositions of Monodisperse Polystyrene Latex Sphere on Unpatterned Semiconductor Wafer Surfaces
