This Document provides specifications and test
methods to evaluate and compare components for particle contribution into an
ultrapure water (UPW) fluid stream. Two methods for evaluating particle contribution
are provided.
The rinse test method evaluates performance in a
flushing mode while the component is in a static state (no actively moving
components within the component under test). It provides an indication of the
flush volume required to bring particle levels to specification.
The dynamic test method evaluates performance during
component operation and provides an indication of the steady state particle
contribution due to dynamic operating conditions.
These test methods apply to liquid chemical and UPW
system components intended for use in semiconductor manufacturing tools and
ancillary equipment.
This Document describes methods for measuring
particle contribution from components while using UPW as the test media. UPW,
for the intents and purposes of this Document, is defined as having the minimum
requirements as outlined in ¶ 7.4 of this Document.
These methods use an in situ liquid optical particle
measurement (OPM) instrument to quantify performance.
Referenced SEMI Standards (purchase separately)
SEMI E49 — Guide for High Purity and Ultrahigh Purity
Piping Performance, Subassemblies, and Final Assemblies
SEMI F57 — Specification for Polymer Components Used in
Ultrapure Water and Liquid Chemical Distribution Systems
Revision History
SEMI F104-0520 (technical revision)
SEMI F104-0312 (technical revision)
SEMI F104-1107 (first published)
