This Specification describes an alphanumeric marking system for silicon wafers. The marking code includes information on the origin, approximate resistivity, dopant species, and crystal growth orientation in addition to a wafer identification number. Use of this Specification ensures the consistency of all wafer marking performed by silicon manufacturers. This consistency allows simplification of the performance requirements of automatic optical character reading (OCR) equipment. In addition, the alphanumeric character size provides for human readability of the mark.

By defining the basic code used to characterize the individual wafer, this Specification provides the information needed for practical operator interpretation.

The alphanumeric marking of this Specification is valid for a broad range of wafer products (e.g., polished, epi, SOI, in-process, and patterned wafers, etc.).

This Specification defines the character set, location, and associated dimensions and tolerances of an alphanumeric code, specifically for identification of flatted and notched silicon wafers.

This Specification does not address the marking techniques that may be employed when complying with this Standard.

Referenced SEMI Standards (purchase separately)

SEMI M1 — Specification for Polished Single Crystal Silicon Wafers

SEMI M20 — Practice for Establishing a Wafer Coordinate System

Revision History

SEMI M13-0523 (technical revision)

SEMI M13-0706 (Reapproved 0318)

SEMI M13-0706 (Reapproved 1011)

SEMI M13-0706 (technical revision)

SEMI M13-1103 (technical revision)

SEMI M13-0998E (editorial revision)

SEMI M13-0998 (technical revision)

SEMI M13-88 (first published - previously designated M1.1-88)