This Specification covers the general requirements for pellicles used on photomasks or reticles in photolithographic exposure systems.

This Specification covers pellicles for use in either broadband, polychromatic or monochromatic exposure systems.

Referenced SEMI Standards (purchase separately)

None.

Revision History

SEMI P5-0416 (Reapproved 1221)

SEMI P5-0416 (technical revision)

SEMI P5-0704 (technical revision)

SEMI P5-94 (Reapproved 1103)

SEMI P5-94 (technical revision)

SEMI P5-92 (technical revision)

SEMI P5-86 (first published)