Tag：StdVol-Microlithography

P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン

P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン

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P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

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P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

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P03600 - SEMI P36 - Guide for Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes (CD-SEM)

P03600 - SEMI P36 - Guide for Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes (CD-SEM)

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P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard

P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard

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P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks

P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks

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P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

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P04500 - SEMI P45 - Specification for Job Deck Data Format for Mask Tools

P04500 - SEMI P45 - Specification for Job Deck Data Format for Mask Tools

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P04800 - SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank

P04800 - SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank

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P00500 - SEMI P5 - Specification for Pellicles

P00500 - SEMI P5 - Specification for Pellicles

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P00900 - SEMI P9 - Guide for Functional Testing of Microelectronic Resists

P00900 - SEMI P9 - Guide for Functional Testing of Microelectronic Resists

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E10000 - SEMI E100 - 6インチまたは230 mmのレチクルの搬送および保管に用いられるレチクルSMIFポッド（RSP）の仕様

E10000 - SEMI E100 - 6インチまたは230 mmのレチクルの搬送および保管に用いられるレチクルSMIFポッド（RSP）の仕様

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E10000 - SEMI E100 - Specification for a Reticle SMIF Pod (RSP) Used to Transport and Store 6 Inch or 230 mm Reticles

E10000 - SEMI E100 - Specification for a Reticle SMIF Pod (RSP) Used to Transport and Store 6 Inch or 230 mm Reticles

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P01000 - SEMI P10 - Specification of Data Structures for Photomask Orders

P01000 - SEMI P10 - Specification of Data Structures for Photomask Orders

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P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates

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P00100 - SEMI P1 - ハードサーフェス・フォトマスク用基板

P00100 - SEMI P1 - ハードサーフェス・フォトマスク用基板

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P01100 - SEMI P11 - アルカリ現像溶液に対する全規定度の測定のテスト方法

P01100 - SEMI P11 - アルカリ現像溶液に対する全規定度の測定のテスト方法

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P01100 - SEMI P11 - Test Method for Determination of Total Normality for Alkaline Developer Solutions

P01100 - SEMI P11 - Test Method for Determination of Total Normality for Alkaline Developer Solutions

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