Tag：StdTpc-Mask and Mask Equipment

E11100 - SEMI E111 - Specification for a 150 mm Reticle SMIF Pod (RSP150) Used to Transport and Store a 6 Inch Reticle

E11100 - SEMI E111 - Specification for a 150 mm Reticle SMIF Pod (RSP150) Used to Transport and Store a 6 Inch Reticle

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E11200 - SEMI E112 - Specification for a 150 mm Multiple Reticle SMIF Pod (MRSP150) Used to Transport and Store Multiple 6 Inch Reticles

E11200 - SEMI E112 - Specification for a 150 mm Multiple Reticle SMIF Pod (MRSP150) Used to Transport and Store Multiple 6 Inch Reticles

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E11700 - SEMI E117 - Specification for Reticle Load Port

E11700 - SEMI E117 - Specification for Reticle Load Port

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P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン

P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン

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P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

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P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

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P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard

P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard

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P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks

P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks

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P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

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P04500 - SEMI P45 - Specification for Job Deck Data Format for Mask Tools

P04500 - SEMI P45 - Specification for Job Deck Data Format for Mask Tools

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P04800 - SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank

P04800 - SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank

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P00500 - SEMI P5 - Specification for Pellicles

P00500 - SEMI P5 - Specification for Pellicles

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T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks

T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks

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E11700 - SEMI E117 - レチクルロードポートの仕様

E11700 - SEMI E117 - レチクルロードポートの仕様

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P01000 - SEMI P10 - Specification of Data Structures for Photomask Orders

P01000 - SEMI P10 - Specification of Data Structures for Photomask Orders

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P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates

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P00100 - SEMI P1 - ハードサーフェス・フォトマスク用基板

P00100 - SEMI P1 - ハードサーフェス・フォトマスク用基板

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P00200 - SEMI P2 - Specification for Chrome Thin Films for Hard Surface Photomasks

P00200 - SEMI P2 - Specification for Chrome Thin Films for Hard Surface Photomasks

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